Tunable Narrowband Terahertz Radiation from van der Waals Ferroelectrics

Chun-Ying Huang, Taketo Handa, Daniel G. Chica, Zhihao Cui, Ding Xu, Jeongheon Choe, Yiliu Li, Margalit L. Feuer, Milan E. Delor, Michael Fechner, David R. Reichman, Xavier Roy & Xiaoyang Zhu
arXiv (preprint)
arXiv:2512.06139
(2025)
Placeholder image for a Spintronics and Ultrafast Dynamics publication
Huang et al. (2025)
arXiv:2512.06139 · placeholder image

Research overview

This preprint reports tunable, narrowband terahertz emission from the van der Waals ferroelectrics NbOX₂ (X = I, Br, Cl), a step towards compact, chip-scale THz sources. Under 800 nm femtosecond excitation, each compound emits a sharp peak: 3.13 THz for NbOI₂, 3.68 THz for NbOBr₂ and 4.88 THz for NbOCl₂, with weaker secondary peaks at higher frequencies. The emission comes from infrared-active phonon modes that modulate the spontaneous polarization along the polar axis. Mixed-halogen alloys emit between their parent compounds, giving continuous tuning from about 3.1 to 5.8 THz. In a NbOI₂ device, an applied electric field switched the ferroelectric domains and reversed the polarity of the emitted THz waveform, showing nonvolatile electrical control. A pair of wire-grid polarizers set the detection polarization in the THz measurement.

Key findings

  • Narrowband THz emission from NbOI₂, NbOBr₂ and NbOCl₂ at 3.13, 3.68 and 4.88 THz
  • Emission driven by infrared-active phonons along the polar axis
  • Halogen alloying gives continuous tuning from about 3.1 to 5.8 THz
  • Nonvolatile electrical control of THz polarity by ferroelectric switching
Huang et al.,
2025

Publication details

Journal

arXiv (preprint)

Volume

Issue

Article

arXiv:2512.06139

Published

2025

Research area

Spintronics and Ultrafast Dynamics

Application

Tunable narrowband THz emission from ferroelectrics

Institution

Columbia University / Max Planck Institute for the Structure and Dynamics of Matter